6.781J / 2.391J Submicrometer and Nanometer Technology

Spring 2006

A nanofabricated electron-beam lithograph.

Bryan Cord nanofabricated this pattern that illustrates the exquisite resolution possible using electron-beam lithography. The principles required to perform this fabrication are described and explained in this course. (Image courtesy of Bryan Cord of the MIT Quantum Nanostructures and Nanofabrication Group.)

Course Highlights

This course features a complete set of assignments and demonstration videos.

Course Description

This course surveys techniques to fabricate and analyze submicron and nanometer structures, with applications. Optical and electron microscopy is reviewed. Additional topics that are covered include: surface characterization, preparation, and measurement techniques, resist technology, optical projection, interferometric, X-ray, ion, and electron lithography; Aqueous, ion, and plasma etching techniques; lift-off and electroplating; and ion implantation. Applications in microelectronics, microphotonics, information storage, and nanotechnology will also be explored.

Acknowledgements

The Instructors would like to thank Bob Barsotti, Bryan Cord, and Ben Wunsch for their work on the Atomic Force Microscope video. They would also like to thank Bryan Cord for creating each video.

Special Features

Technical Requirements

Special software is required to use some of the files in this course: .mov.

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Staff

Instructors:
Prof. George Barbastathis
Prof. Karl Berggren
Prof. Henry Smith

Course Meeting Times

Lectures:
Two sessions / week
1.5 hours / session

Level

Graduate